Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California

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Bibliographic Information

Title
"Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies IX : 7-8 March 1990, San Jose, California"
Statement of Responsibility
Douglas J. Resnick, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering
Publisher
  • SPIE
Publication Year
  • c1990
Book size
28 cm

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Notes

Proceedings of the SPIE Symposium on Microlithography

Includes bibliographical references

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Details 詳細情報について

  • CRID
    1130282272110747904
  • NII Book ID
    BA26792870
  • ISBN
    0819403105
  • LCCN
    90060893
  • Web Site
    https://lccn.loc.gov/90060893
  • Text Lang
    en
  • Country Code
    us
  • Title Language Code
    en
  • Place of Publication
    • Bellingham, Wash., USA
  • Data Source
    • CiNii Books
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