Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A.

CiNii 所蔵館 3館

書誌事項

タイトル
"Materials, technology and reliability of low-k dielectrics and copper interconnects : symposium held April 18-21, 2006, San Francisco, California, U.S.A."
責任表示
editors, Ting Y. Tsui ... [et al.]
出版者
  • Materials Research Society
出版年月
  • c2006
書籍サイズ
24 cm

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注記

"... Symposium F, "Materials, Technology and Reliability of Low-k Dielectrics and Cooper Interconnects," held April 18-21 at the 2006 MRS Spring Meeting in San Francisco, California ..."--Pref

Includes bibliographical references and indexes

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