Effects of Capacitively Coupled Radio Frequency Krypton and Argon Plasmas on Gallium Nitride Etching Damage

Details 詳細情報について

• CRID

  1360003446854928000

• NII Article ID

  210000067284

• DOI

  10.1143/jjap.48.08hf01

• ISSN

  13474065

  00214922

  http://id.crossref.org/issn/13474065

• Data Source

  • Crossref
  • CiNii Articles