Dry etching of Al-rich AlGaAs with silicon nitride masks for photonic crystal fabrication

Details 詳細情報について

• CRID

  1360003449889823872

• NII Article ID

  210000144911

• DOI

  10.7567/jjap.54.042003

• ISSN

  13474065

  00214922

• Web Site

  http://stacks.iop.org/1347-4065/54/i=4/a=042003/pdf

  http://stacks.iop.org/1347-4065/54/i=4/a=042003?key=crossref.f693f775ecfe9b01c29080c269c61538

• Data Source

  • Crossref
  • CiNii Articles