Atmospheric-pressure plasma-enhanced chemical vapor deposition of microporous silica membranes for gas separation

DOI Web Site Web Site 被引用文献8件 参考文献43件

書誌事項

公開日
2017-02
資源種別
journal article
権利情報
  • https://www.elsevier.com/tdm/userlicense/1.0/
  • https://www.elsevier.com/legal/tdmrep-license
  • http://www.elsevier.com/open-access/userlicense/1.0/
  • https://doi.org/10.15223/policy-017
  • https://doi.org/10.15223/policy-037
  • https://doi.org/10.15223/policy-012
  • https://doi.org/10.15223/policy-029
  • https://doi.org/10.15223/policy-004
DOI
  • 10.1016/j.memsci.2016.11.067
公開者
Elsevier BV

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説明

Abstract Microporous silica membranes with high permselectivity are fabricated by atmospheric-pressure plasma-enhanced chemical vapor deposition (AP-PECVD) using hexamethyldisiloxane as the precursor in plasma working gases of pure argon, and mixture of argon with oxygen or nitrogen. A silica membrane grown using plasma composed of a mixture of argon and nitrogen displays highly efficient gas separation, with selectivities for He/N 2 and He/SF 6 of 196 and 820, respectively, and He permeance of 1.1×10 −7  mol m −2  s −1  Pa −1 at 50 °C. Characterization of the membranes by FTIR and X-ray photoelectron spectroscopies reveals a relatively high concentration of carbon remains in the membrane grown using a mixture of argon and nitrogen. Annealing at elevated temperature after plasma deposition improves the permselectivity of the membranes. After annealing at 300 °C, the permeance of He at 50 °C increased to 4.0×10 -7  mol m -2 s -1 Pa -1 with no marked decrease of selectivity (He/N 2 =98, He/SF 6 =770). The annealed membrane also exhibits remarkable permselectivity for CO 2 , showing selectivities for CO 2 /N 2 and CO 2 /CH 4 of 46 and 166, respectively, with CO 2 permeance of 1.9×10 -7  mol m -2  s -1  Pa -1 at 50 °C. AP-PECVD shows great promise to fabricate microporous silica membranes highly permselective for gas separation.

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