<i>XY</i> stage driven by ultrasonic linear motors for the electron-beam x-ray mask writer EB-X3

DOI PDF 被引用文献7件
  • T. Kunioka
    NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa Pref. 243-0198, Japan
  • Y. Takeda
    NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa Pref. 243-0198, Japan
  • T. Matsuda
    NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa Pref. 243-0198, Japan
  • N. Shimazu
    ANGEL Labs Corporation, 1-14-20 Shin-yokohama, Kouhoku-ku, Yokohama, Kanagawa Pref. 222-0033, Japan
  • Y. Nakayama
    Super-fine SR Lithography Laboratory, ASET, c/o NTT Telecommunications Energy Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa Pref. 243-0198, Japan

説明

<jats:p>A new XY stage employing ultrasonic linear motors that is simple, compact, and completely nonmagnetic was developed for an e-beam x-ray mask writer employing step-and-repeat writing. The main performance results are: (1) position fluctuations during writing are less than ±4 nm; (2) the time for a 650 μm step movement is less than 270 ms; (3) the magnetic interference is less than ±1 nT at the e-beam deflection center; and (4) the vibration of the stage when moving at a constant speed is less than ±0.25 m/s2. The new stage is also very easy to maintain. It has been installed in the EB-X3 e-beam x-ray mask writer.</jats:p>

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