Marks for alignment and registration in projection electron lithography

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<jats:p>This article discusses the relevant criteria for selecting alignment marks for projection electron lithography. The mark material, topography, and pattern layout are considered. Results from experiments and calculations indicate that there is a wide range of acceptable mark configurations suitable for use with short beam dwell times. These results are based on analyses of the available backscattered electron signal and experimentally obtained detection accuracy within the nanometer range.</jats:p>

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