Area-Selective Atomic Layer Deposition on Chemically Similar Materials: Achieving Selectivity on Oxide/Oxide Patterns
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- Tzu-Ling Liu
- Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, United States
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- Stacey F. Bent
- Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States
Journal
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- Chemistry of Materials
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Chemistry of Materials 33 (2), 513-523, 2021-01-08
American Chemical Society (ACS)
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Details 詳細情報について
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- CRID
- 1360017284961034752
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- ISSN
- 15205002
- 08974756
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- Data Source
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- Crossref