Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization
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- Takashi Ubukata
- Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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- Megumi Nakayama
- Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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- Taishi Sonoda
- Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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- Yasushi Yokoyama
- Department of Advanced Materials Chemistry, Graduate School of Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya, Yokohama 240-8501, Japan
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- Hideyuki Kihara
- Research Institute for Sustainable Chemistry (ISCHEM), National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan
書誌事項
- 公開日
- 2016-08-17
- 資源種別
- journal article
- DOI
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- 10.1021/acsami.6b07943
- 公開者
- American Chemical Society (ACS)
この論文をさがす
説明
A facile method for the fabrication of a highly sensitive surface relief is demonstrated, which operates on the principle of spatially patterned photopolymerization-induced mass transport in the amorphous films of a series of bisanthracene compounds. The stability of the resultant colorless transparent relief structure is dramatically improved owing to the polymerization of the bisanthracene.
収録刊行物
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- ACS Applied Materials & Interfaces
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ACS Applied Materials & Interfaces 8 (34), 21974-21978, 2016-08-17
American Chemical Society (ACS)
