Plasma–surface interactions for advanced plasma etching processes in nanoscale ULSI device fabrication: A numerical and experimental study
Journal
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- Thin Solid Films
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Thin Solid Films 518 (13), 3461-3468, 2010-04
Elsevier BV
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Details 詳細情報について
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- CRID
- 1360567182493857792
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- ISSN
- 00406090
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- Data Source
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- Crossref
- KAKEN