Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation

Details 詳細情報について

• CRID

  1360567184378188672

• DOI

  10.1088/1361-6463/aa8523

• ISSN

  13616463

  00223727

• Web Site

  http://stacks.iop.org/0022-3727/50/i=41/a=414001?key=crossref.caa077644f1867dcdf361d2cd49c313f

  http://iopscience.iop.org/article/10.1088/1361-6463/aa8523/pdf

  http://stacks.iop.org/0022-3727/50/i=41/a=414001/pdf

  http://iopscience.iop.org/article/10.1088/1361-6463/aa8523

• Data Source

  • Crossref
  • KAKEN