Room temperature replication in spin on glass by nanoimprint technology

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  • S. Matsui
    Laboratory of Advanced Science and Technology, Himeji Institute of Technology, Hyogo 678-1201, Japan
  • Y. Igaku
    Laboratory of Advanced Science and Technology, Himeji Institute of Technology, Hyogo 678-1201, Japan
  • H. Ishigaki
    Laboratory of Advanced Science and Technology, Himeji Institute of Technology, Hyogo 678-1201, Japan
  • J. Fujita
    NEC Fundamental Research Laboratories, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
  • M. Ishida
    NEC Fundamental Research Laboratories, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
  • Y. Ochiai
    NEC Fundamental Research Laboratories, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
  • M. Komuro
    Advanced Semiconductor Research Center, AIST, 1-1 Umezono 1-chome, Tsukuba, Ibaraki 305-8568, Japan
  • H. Hiroshima
    Advanced Semiconductor Research Center, AIST, 1-1 Umezono 1-chome, Tsukuba, Ibaraki 305-8568, Japan

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<jats:p>A compact nanoimprint lithography (NIL) system using the driving power of a stepping motor has been developed. Compared to a conventional NIL system with a hydraulic press, there are some additional features of the NIL system such as compactness and low cost. We propose the use of spin on glass (SOG) instead of PMMA to avoid thermal expansion and demonstrate SOG patterns with 200 nm linewidths at room temperature replications using the NIL system. The SOG patterns were transferred to gold metal using liftoff and to a silicon substrate by reactive ion etching.</jats:p>

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