<i>I</i> <i>n</i> <i>s</i> <i>i</i> <i>t</i> <i>u</i> vaporization of very low molecular weight resists using 1/2 nm diameter electron beams

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<jats:p>A technique is presented for in situ measurements of contrast curves for electron beam vaporizable resists. Using a 1/2 nm diam beam of 100 keV electrons, we have etched lines, holes and patterns in NaCl crystals at the 2 nm size scale. Troughs about 1.5 nm wide on 4.5 nm centers and 2 nm diam holes have been etched completely through NaCl crystals more than 30 nm thick.</jats:p>

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