Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

DOI Web Site Web Site 4 Citations

Journal

International Journal of Electrochemical Science

International Journal of Electrochemical Science 6 (12), 6094-6104, 2011-12

Elsevier BV

Citations (4)*help

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Details 詳細情報について

CRID

1360579820491885824
DOI

10.1016/s1452-3981(23)19665-9
ISSN

14523981
Web Site

https://api.elsevier.com/content/article/PII:S1452398123196659?httpAccept=text/xml

https://api.elsevier.com/content/article/PII:S1452398123196659?httpAccept=text/plain
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