Annealing Effects on the Properties of Copper Oxide Thin Films Prepared by Chemical Deposition

詳細情報 詳細情報について

• CRID

  1360579820491885824

• DOI

  10.1016/s1452-3981(23)19665-9

• ISSN

  14523981

• Web Site

  https://api.elsevier.com/content/article/PII:S1452398123196659?httpAccept=text/xml

  https://api.elsevier.com/content/article/PII:S1452398123196659?httpAccept=text/plain

• データソース種別

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