New development of atomic layer deposition: processes, methods and applications
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- Peter Ozaveshe Oviroh
- University of Johannesburg
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- Rokhsareh Akbarzadeh
- University of Johannesburg
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- Dongqing Pan
- University of North Alabama
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- Rigardt Alfred Maarten Coetzee
- University of Johannesburg
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- Tien-Chien Jen
- University of Johannesburg
書誌事項
- 公開日
- 2019-05-23
- 権利情報
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- http://creativecommons.org/licenses/by/4.0/
- DOI
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- 10.1080/14686996.2019.1599694
- 公開者
- Informa UK Limited
この論文をさがす
収録刊行物
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- Science and Technology of Advanced Materials
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Science and Technology of Advanced Materials 20 (1), 465-496, 2019-05-23
Informa UK Limited
