Recovery Strategy of Fatigue-Limited Endurance in Si FeFETs With Thin HfZrO₂ Films

  • Zuocheng Cai
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Zhenhong Liu
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Yan-Kui Liang
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Xueyang Han
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Shin-Yi Min
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Eishin Nako
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Seong-Kun Cho
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Chia-Tsong Chen
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Mitsuru Takenaka
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Kasidit Toprasertpong
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan
  • Shinichi Takagi
    Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan

書誌事項

公開日
2025-01
資源種別
journal article
権利情報
  • https://ieeexplore.ieee.org/Xplorehelp/downloads/license-information/IEEE.html
  • https://doi.org/10.15223/policy-029
  • https://doi.org/10.15223/policy-037
DOI
  • 10.1109/ted.2024.3493065
公開者
Institute of Electrical and Electronics Engineers (IEEE)

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