Dry-Etching Processes for High-Aspect-Ratio Features with Sub-10 nm Resolution High-χ Block Copolymers
-
- Gwenaelle Pound-Lana
- Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France
-
- Philippe Bézard
- Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France
-
- Camille Petit-Etienne
- Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France
-
- Sébastien Cavalaglio
- Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France
-
- Gilles Cunge
- Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France
-
- Benjamin Cabannes-Boué
- Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
-
- Guillaume Fleury
- Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
-
- Xavier Chevalier
- ARKEMA FRANCE, GRL, Route Nationale 117, BP34, 64170 Lacq, France
-
- Marc Zelsmann
- Univ. Grenoble Alpes, CNRS, CEA/LETI Minatec, Grenoble INP, LTM, 38000 Grenoble, France
Journal
-
- ACS Applied Materials & Interfaces
-
ACS Applied Materials & Interfaces 13 (41), 49184-49193, 2021-10-12
American Chemical Society (ACS)
- Tweet
Details 詳細情報について
-
- CRID
- 1360861710913179520
-
- ISSN
- 19448252
- 19448244
-
- Data Source
-
- Crossref