Measurement of C2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation

M. Hiramatsu, K. Kato, C.H. Lau, J.S. Foord, M. Hori

doi:10.1016/s0925-9635(02)00216-9

Measurement of C2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation

DOI Web Site Web Site 被引用文献7件オープンアクセス

書誌事項

公開日: 2003-03

権利情報

https://www.elsevier.com/tdm/userlicense/1.0/

DOI

10.1016/s0925-9635(02)00216-9

公開者: Elsevier BV

この論文をさがす

CiNii Books

説明

Abstract C 2 radical density in a conventional microwave plasma-enhanced chemical vapor deposition (MWPCVD) with CH 4 /H 2 mixture was measured using absorption spectroscopy. At the typical growth conditions for MWPCVD used for nanocrystalline diamond formation, C 2 radical density in the plasma was of the order of 10 12 cm −3 . Correlation between nanocrystalline diamond growth and C 2 radical density was discussed.