Mechanistic study on photocuring of a methacrylates copolymer by benzophenones

Yoshikatsu Ito, Yasushi Aoki, Teruo Matsuura, Nobuhiro Kawatsuki, Masao Uetsuki

doi:10.1002/app.1991.070420213

Mechanistic study on photocuring of a methacrylates copolymer by benzophenones

DOI Web Site Web Site 被引用文献2件

書誌事項

公開日: 1991-01-20

権利情報

http://onlinelibrary.wiley.com/termsAndConditions#vor

DOI

10.1002/app.1991.070420213

公開者: Wiley

この論文をさがす

CiNii Books

説明

<jats:title>Abstract</jats:title><jats:p>The types of photochemical reactions that will occur in the photosensitive resin for optical devices, poly(methyl methacrylate‐<jats:italic>co</jats:italic>‐crotyl methacrylate) (PMMA–CMA) doped with <jats:italic>meta</jats:italic>‐benzoylbenzophenone (BBP), were investigated. Oxetane formation, hydrogen abstraction followed by radical coupling, and pinacol formation were found to occur. The quantum yield for disappearance of benzophenone (BP) in the PMMA–CMA film was estimated as 0.68. The pendant crotyl group seems to be a major photoreaction site.</jats:p>