Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography

R. Takei, M. Suzuki, E. Omoda, S. Manako, T. Kamei, M. Mori, Y. Sakakibara

doi:10.1063/1.4795308

Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography

DOI PDF 被引用文献7件

R. Takei

National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki, 305-8568, Japan and Institute for Photonics-Electronics Convergence System Technology (PECST), Tsukuba, Ibaraki, 305-8568, Japan
M. Suzuki

National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki, 305-8568, Japan and Institute for Photonics-Electronics Convergence System Technology (PECST), Tsukuba, Ibaraki, 305-8568, Japan
E. Omoda

National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki, 305-8568, Japan and Institute for Photonics-Electronics Convergence System Technology (PECST), Tsukuba, Ibaraki, 305-8568, Japan
S. Manako

National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki, 305-8568, Japan and Institute for Photonics-Electronics Convergence System Technology (PECST), Tsukuba, Ibaraki, 305-8568, Japan
T. Kamei

National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki, 305-8568, Japan and Institute for Photonics-Electronics Convergence System Technology (PECST), Tsukuba, Ibaraki, 305-8568, Japan
M. Mori

National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki, 305-8568, Japan and Institute for Photonics-Electronics Convergence System Technology (PECST), Tsukuba, Ibaraki, 305-8568, Japan
Y. Sakakibara

National Institute of Advanced Industrial Science and Technology (AIST) , Tsukuba, Ibaraki, 305-8568, Japan and Institute for Photonics-Electronics Convergence System Technology (PECST), Tsukuba, Ibaraki, 305-8568, Japan

抄録

<jats:p>For ultralow-loss and polarization-insensitive spot-size converters (SSCs) on a silicon platform, we propose and demonstrate a silicon knife-edge taper waveguide with a gradual decrease in height as well as width toward the taper end. The taper was fabricated using a double-patterning method involving i-line stepper photolithography and angled sidewall dry-etching. The SSC, with the knife-edge taper covered with a polymer secondary core, exhibited mode conversion losses of 0.35 and 0.21 dB for transverse electric-like and transverse magnetic-like modes, respectively.</jats:p>