Molecular Beam Deposition of Nanoscale Ionic Liquids in Ultrahigh Vacuum
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- Shingo Maruyama
- Materials and Structures Laboratory
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- Yoko Takeyama
- Materials and Structures Laboratory
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- Hiroki Taniguchi
- Materials and Structures Laboratory
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- Hiroki Fukumoto
- Chemical Resources Laboratory
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- Mitsuru Itoh
- Materials and Structures Laboratory
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- Hiroshi Kumigashira
- Department of Applied Chemistry and JST-CREST, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan
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- Masaharu Oshima
- Department of Applied Chemistry and JST-CREST, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan
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- Takakazu Yamamoto
- Chemical Resources Laboratory
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- Yuji Matsumoto
- Materials and Structures Laboratory
書誌事項
- 公開日
- 2010-09-23
- DOI
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- 10.1021/nn101036v
- 公開者
- American Chemical Society (ACS)
この論文をさがす
説明
We propose a new approach to nanoscience and technology for ionic liquids (ILs): molecular beam deposition of IL in ultrahigh vacuum by using a continuous wave infrared (CW-IR) laser deposition technique. This approach has made it possible to prepare a variety of "nano-IL" with the given composition on the substrate: a nanodroplet, on one hand, the volume of which goes down to 1 aL and, on the other hand, an ultrathin film with a thickness to several 100 nm or less. The result of fractional distillation of a binary mixture of ILs, investigated by nuclear magnetic resonance as well as electrospray ionization time-of-flight mass spectrometry, indicates that this deposition process is based on the thermal evaporation of ILs, and thus this process also can be used as a new purification method of ILs in vacuum. Furthermore, the fabrication of binary mixture droplets of two ILs on the substrate by alternating deposition of two ILs was demonstrated; the homogeneity of the composition was confirmed even for one single droplet by high-spatial-resolution Raman spectroscopy.
収録刊行物
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- ACS Nano
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ACS Nano 4 (10), 5946-5952, 2010-09-23
American Chemical Society (ACS)
