Influence of the growth parameters on TiO2 thin films deposited using the MOCVD method
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- M. I. B. Bernardi
- Universidade Federal de São Carlos, Brazil
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- E. J. H. Lee
- Universidade Federal de São Carlos, Brazil
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- P. N. Lisboa-Filho
- Universidade Federal de São Carlos, Brazil
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- E. R. Leite
- Universidade Federal de São Carlos, Brazil
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- E. Longo
- Universidade Federal de São Carlos, Brazil
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- A. G. Souza
- UFPB
抄録
<jats:p>In this work we report the synthesis of TiO2 thin films by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during the growth in the obtained structural characteristics was studied. Different temperatures of the organometallic bath, deposition time, temperature and type of the substrate were combined. Using Scanning Electron Microscopy associated to Electron Dispersive X-Ray Spectroscopy, Atomic Force Microscopy and X-ray Diffraction, the strong influence of these parameters in the thin films final microstructure was verified.</jats:p>
収録刊行物
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- Cerâmica
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Cerâmica 48 (308), 192-198, 2002-12
FapUNIFESP (SciELO)