Growth Characteristics and Film Properties of Cerium Dioxide Prepared by Plasma-Enhanced Atomic Layer Deposition

詳細情報 詳細情報について

• CRID

  1361981470410677760

• DOI

  10.1149/1.3594766

• ISSN

  00134651

• Web Site

  https://syndication.highwire.org/content/doi/10.1149/1.3594766

• データソース種別

  • Crossref