Quantitative ellipsometric microscopy at the silicon–air interface

  • F. Linke
    Institut für Schichten und Grenzflächen , Institut 4: Biologische Schichten (ISG4), Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany
  • R. Merkel
    Institut für Schichten und Grenzflächen , Institut 4: Biologische Schichten (ISG4), Forschungszentrum Jülich GmbH, D-52425 Jülich, Germany

抄録

<jats:p>Ellipsometric microscopy is a technique that combines the merits of ellipsometry and light microscopy, i.e., it allows noninvasive, label-free measurements of thin film thickness and refractive index at high lateral resolution. Here we give a detailed description of the technique including a complete calibration scheme and a model to correct for the instrumental polarization of the imaging optics. The performance of the instrument was studied experimentally. We found a lateral resolution of 1μm and an absolute height accuracy of 3nm. The measured refractive indices were accurate to 2.3% and the height sensitivity of the instrument was smaller than 5Å. Another virtue of the instrument design besides its good performance is that it is in essence an extension of standard light microscopy and could be integrated into commercial microscopes.</jats:p>

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