Pulsed plasma etching for semiconductor manufacturing

Details 詳細情報について

• CRID

  1362262944407327104

• DOI

  10.1088/0022-3727/47/30/303001

• ISSN

  13616463

  00223727

  http://id.crossref.org/issn/00223727

• Web Site

  http://stacks.iop.org/0022-3727/47/i=30/a=303001/pdf

  http://stacks.iop.org/0022-3727/47/i=30/a=303001?key=crossref.fc907816655d471b01acc79cee2e10d1

• Data Source

  • Crossref