Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries
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- Mark P. Stoykovich
- Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
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- Huiman Kang
- Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
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- Kostas Ch. Daoulas
- Institut für Theoretische Physik, Georg-August Universität, 37077 Göttingen, Germany
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- Guoliang Liu
- Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
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- Chi-Chun Liu
- Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
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- Juan J. de Pablo
- Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
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- Marcus Müller
- Institut für Theoretische Physik, Georg-August Universität, 37077 Göttingen, Germany
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- Paul F. Nealey
- Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
収録刊行物
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- ACS Nano
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ACS Nano 1 (3), 168-175, 2007-10-06
American Chemical Society (ACS)
