Patterning of narrow porous SiOCH trenches using a TiN hard mask

DOI Web Site Web Site 1 Citations

Journal

Microelectronic Engineering

Microelectronic Engineering 85 (11), 2226-2235, 2008-11

Elsevier BV

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CRID

1363670319145159680
DOI

10.1016/j.mee.2008.06.025
ISSN

01679317
Web Site

https://api.elsevier.com/content/article/PII:S0167931708003195?httpAccept=text/xml

https://api.elsevier.com/content/article/PII:S0167931708003195?httpAccept=text/plain
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