Solution Growth of SiC Crystal with High Growth Rate Using Accelerated Crucible Rotation Technique

DOI DOI PDF 被引用文献13件

書誌事項

公開日
2006-10-15
権利情報
  • https://www.scientific.net/PolicyAndEthics/PublishingPolicies
  • https://www.scientific.net/license/TDM_Licenser.pdf
DOI
  • 10.4028/www.scientific.net/msf.527-529.119
  • 10.4028/0-87849-425-1.119
公開者
Trans Tech Publications, Ltd.

説明

<jats:p>We performed solution growth of SiC single crystals from Si-Ti-C ternary solution using the accelerated crucible rotation technique (ACRT). It was confirmed that the growth rate exceeding 200 μm/hr was achievable by several ACRT conditions. This high growth rate might be due to the enhancement of the carbon transport from the graphite crucible to the growth interface using the ACRT. Moreover, the incorporation of inclusions of the Si-Ti solvent in the grown crystal was significantly suppressed by using the ACRT. It was thought that the intensive convection near the growth interface resulted in not only the marked increase of SiC growth rate but also the superior homogeneity in the surface morphology. It was concluded that faster stable growth can be accomplished in the SiC solution growth using the ACRT.</jats:p>

収録刊行物

被引用文献 (13)*注記

もっと見る

詳細情報 詳細情報について

問題の指摘

ページトップへ