Seeded growth fabrication of Cu-on-Si electrodes for in situ ATR-SEIRAS applications

Hui-Feng Wang, Yan-Gang Yan, Sheng-Juan Huo, Wen-Bin Cai, Qun-Jie Xu, Masatoshi Osawa

doi:10.1016/j.electacta.2007.03.042

Seeded growth fabrication of Cu-on-Si electrodes for in situ ATR-SEIRAS applications

DOI Web Site Web Site 被引用文献1件

書誌事項

公開日: 2007-05

権利情報

https://www.elsevier.com/tdm/userlicense/1.0/

DOI

10.1016/j.electacta.2007.03.042

公開者: Elsevier BV

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説明

Abstract A seeded-growth approach has been developed to fabricate a Cu nanoparticle film (simplified hereafter with nanofilm) on Si for electrochemical ATR surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS). The approach comprises an initial activation of the reflecting plane of hemicylindrical Si prism by introducing a Cu seed layer in a CuSO 4 -HF solution and the subsequent electroless deposition of the Cu nanofilms from an electroless Cu plating bath. The as-deposited Cu nanofilm exhibited strong SEIRA effect for the CO probe and interfacial free H 2 O. ATR-SEIRAS was also applied to characterize the adsorbed geometries of pyridine at the Cu/electrolyte interface. Only vibrational bands assignable to the A 1 symmetry modes were detected in the entire potential window investigated, suggestive of an end-on adsorption via the ring N-atom on a Cu electrode.