Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al<sub>2</sub>O<sub>3</sub> Using Sequential, Self-Limiting Thermal Reactions

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  • Younghee Lee
    Department of Chemistry and Biochemistry, ‡Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, United States
  • Jaime W. DuMont
    Department of Chemistry and Biochemistry, ‡Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, United States
  • Steven M. George
    Department of Chemistry and Biochemistry, ‡Department of Mechanical Engineering, University of Colorado, Boulder, Colorado 80309, United States

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