Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by r.f. reactive magnetron sputtering

Details 詳細情報について

• CRID

  1364233268323706880

• NII Article ID

  30006175159

• DOI

  10.1016/s0040-6090(97)01053-5

• ISSN

  00406090

• Web Site

  https://api.elsevier.com/content/article/PII:S0040609097010535?httpAccept=text/xml

  https://api.elsevier.com/content/article/PII:S0040609097010535?httpAccept=text/plain

• Data Source

  • Crossref
  • CiNii Articles