Extremely high aspect ratio GaAs and GaAs/AlGaAs nanowaveguides fabricated using chlorine ICP etching with N<sub>2</sub>-promoted passivation
Journal
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- Nanotechnology
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Nanotechnology 21 (13), 134014-, 2010-03-08
IOP Publishing
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Keywords
Details 詳細情報について
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- CRID
- 1364233268454852480
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- ISSN
- 13616528
- 09574484
- http://id.crossref.org/issn/09574484
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- Data Source
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- Crossref