The Effect of an Electromagnetic Wave Shield for Ni Thin Films by Magnetron Sputtering with Multipolar Magnetic Plasma Confinement

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  • KUMABUCHI Zenta
    Department of Electronics and Photonic Systems, Hiroshima Institute of Technology
  • MIYANO Tadafumi
    Western Hiroshima Prefecture Industrial Research Institute of Technology
  • KAWAI Katuhiro
    Department of Electronic Functions and System Engineering, Interdisciplinary Faculty of Science and Engineering, Shimane University
  • KAWABATA Keishi
    Department of Electronics and Photonic Systems, Hiroshima Institute of Technology
  • KAJIOKA Hideshi
    Western Hiroshima Prefecture Industrial Research Institute of Technology
  • HONDA Shigeo
    Department of Electronic Functions and System Engineering, Interdisciplinary Faculty of Science and Engineering, Shimane University

Bibliographic Information

Other Title
  • 多重磁極マグネトロンスパッタ法により作製したＮｉ薄膜の電磁波シールド効果
  • タジュウ ジキョク マグネトロンスパッタホウ ニ ヨリ サクセイ シタ Ni ハクマク ノ デンジハ シールド コウカ

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Description

Nickel thin films for an electromagnetic wave shield were produced by magnetron sputtering with multipolar magnetic plasma confinement (MMPC). The characteristics of the electromagnetic wave shield have been measured by the Kansai Electronic Industry Development Center (KEC) method. The effectiveness of the electromagnetic wave shields of electric field and magnetic field depends significantly on the thickness of Ni thin films deposited on the glass substrate. The shielding effectiveness of the electric field, measured at 800 MHz for 5 μm-thick deposited films, was 92 dB. The value was similar to a 2 mm-thick aluminum plate. For the magnetic field, its effectiveness was 73 dB. It is shown that the dependence of film thickness on the electromagnetic wave shield is due to attenuation loss.

Journal

  • Shinku

    Shinku 47 (3), 175-178, 2004

    The Vacuum Society of Japan

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