In Situ Analysis of Incident Ions on Chamber Surface in Electron Cyclotron Resonance Etching.
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- YAMANE Miyuki
- Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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- KAWADA Hiroki
- Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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- KITSUNAI Hiroyuki
- Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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- TSUMAKI Nobuo
- Mechanical Engineering Research Laboratory, Hitachi, Ltd.
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- YAMASHITA Manabu
- Device Development Center, Hitachi, Ltd.
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- SUZUKI Shinichi
- Device Development Center, Hitachi, Ltd.
Bibliographic Information
- Other Title
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- 有磁場マイクロ波エッチング装置内壁に入射するイオンのｉｎ ｓｉｔｕ分析
- ユウジバ マイクロハ エッチング ソウチ ナイヘキ ニ ニュウシャ スル イオン ノ in situ ブンセキ
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Abstract
Incident ions on the chamber surface in electron cyclotron resonance plasma were characterized in situ using a quadrupole mass analyzer, which was shielded with an 1-mm-thick cylinder made of highly permeable material. The incident ions were identified as Clx+, BClx+, AlxCly+, CxCly+ and SixCly+. Their incident energy was about 5 eV, as determined by the potential difference at the sheath. The BClx+ incident ions reacted with OH which is abundant on the surface of the quartz cylinder and formed B2O3 as identified by infrared reflection absorption spectroscopy.
Journal
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- Shinku
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Shinku 43 (8), 812-816, 2000
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001204063518592
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- NII Article ID
- 10004562745
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 5476147
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed