反応性スパッタリングとターゲット　　オゾン添加反応性直流マグネトロンスパッタによるＩＴＯの成膜

DOI Web Site 参考文献18件

書誌事項

タイトル別名
  • Targets for High Rate Reactive Sputtering. ITO Deposition by Reactive dc Magnetron Sputtering with Ozone Introduction.
  • オゾン テンカ ハンノウセイ チョクリュウ マグネトロンスパッタ ニ ヨル ITO ノ セイマク

この論文をさがす

抄録

Reactive magnetron sputtering using alloy targets to deposit transparent conductive oxide (TCO) is expected to have a high potential for low cost deposition with high deposition rates. However, at low substrate temperature fully oxidized films with high crystallinity are rather difficult to deposit compared with the sputtering using oxide ceramic targets. In this study oxygen-ozone mixture gas was used as a reactive gas for the enhancement of the oxidation during film growth in the reactive magnetron sputtering processes. Tin-doped Indium Oxide (ITO) films were deposited by dc reactive sputtering using an In-Sn (Sn : 10 wt%) alloy target with the introduction of oxygen-ozone mixture gases (ozone : 010 vol%) on soda-lime glass substrates which were not heated and confirmed to be lower than 60°C during the deposition. The oxidation enhancement by the ozone introduction was observed for both target surface and film surface during the deposition. Polycrystalline transparent ITO films were successfully deposited by the ozone introduction at the “metal mode” region where the target surface was not fully oxidized and hence deposition rate was higher by about one order of magnitude than the one at “oxide mode”.

収録刊行物

  • 真空

    真空 43 (8), 779-784, 2000

    一般社団法人 日本真空学会

参考文献 (18)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ