書誌事項
- タイトル別名
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- Development of New Horizontal High-Current HCD Apparatus and Properties of Continuously Coated TiN Film.
- スイヘイ イッタイガタ ダイ デンリュウ デンシ ビーム ソウチ ノ カイハツ
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説明
The new horizontal high-current HCD apparatus can accomplish very stable and continuous TiN coating over a long period of 40 h at a high ionization rate of 75% and a high evaporation rate of 5 μm/min. The characteristics of this apparatus are (1) the use of a horizontal and high-current HCD electron beam which was bent 90° on the crucible, (2) adoption of a coupled structure in the Ta cathode and focusing coil, (3) setting up of the focusing coils around the crucible, in the path of evaporant, and behind the substrate, and (4) protection of the focusing coil by a jacket around its periphery.<BR>By installing this horizontal HCD gun in a continuous air-to-air ion plating apparatus (pilot line), it became possible to perform very stable and continuous TiN coating of the stainless steel coil for a period of 40 h.<BR>The properties of the TiN films coated using the pilot line are comparable to those of films coated using the batch-type HCD apparatus.
収録刊行物
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- 真空
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真空 38 (7), 639-645, 1995
一般社団法人 日本真空学会
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詳細情報 詳細情報について
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- CRID
- 1390001204063880320
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- NII論文ID
- 10001693414
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- NII書誌ID
- AN00119871
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- COI
- 1:CAS:528:DyaK2MXotlCksL8%3D
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- ISSN
- 18809413
- 05598516
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- NDL書誌ID
- 3629409
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDLサーチ
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可
