Density of the Boron Thin Films Obtained by Ion Beam Sputter Deposition

DOI Web Site
  • HOJOU Kiichi
    Solid State Chemistry Lab., Division of Chemistry, Japan Atomic Energy Reseach Institute

Bibliographic Information

Other Title
  • イオンビームスパッタ法によって作られたボロン薄膜の密度測定
  • イオン ビーム スパッタホウ ニ ヨッテ ツクラレタ ボロン ハクマク ノ ミ

Search this article

Description

The thickness of amorphous boron films prepared by ion beam sputter deposition is measured using trasmission electron microscopy (TEM). The point of this method is to hold the preparated films at both side with the deposited metal layers of Pt-Pd by vacuum evaporation or W by ion beam sputtering. Especially, metal layer at outside is effective to except the influence of contamination to be polymerzed in TEM.<BR>Based on the ion beam sputter deposition theory, the density of boron films is calculated. As a result, the film density is found to be independent of thickness. The density of amorphous boron films made by ion beam sputter deposition (ρ=2.4±0.18 g/cm3) is in close agreement with the result obtained by N. N. Greenwood (ρ =2.35 g/cm3).

Journal

  • Shinku

    Shinku 27 (7), 589-595, 1984

    The Vacuum Society of Japan

Keywords

Details 詳細情報について

Report a problem

Back to top