Fine-Controlled Surface Modification Techniques in III-V Compound Semiconductor Materials(Atomic Layer Epitaxy).
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- MEGURO Takashi
- The Institute of Physical and Chemical Research (RIKEN)
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- AOYAGI Yoshinobu
- The Institute of Physical and Chemical Research (RIKEN)
Bibliographic Information
- Other Title
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- III‐V族化合物半導体材料の表面精密加工技術(原子層エピタキシー)
- 3 5ゾク カゴウブツ ハンドウタイ ザイリョウ ノ ヒョウメン セイミツ カ
- Atomic Layer Epitaxy
- 原子層エピタキシー
Search this article
Journal
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- Shinku
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Shinku 36 (2), 73-80, 1993
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001204065045760
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- NII Article ID
- 10007955497
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 3808469
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles