Electrical properties of Al-doped and B-doped amorphous SiC:H films prepared by cosputtering.
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- TOMIOKA Yugo
- Research Institute of Electronice, Shizuoka University
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- SAITO Nobuo
- Research Institute of Electronice, Shizuoka University
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- YAMAGUCHI Tomuo
- Research Institute of Electronice, Shizuoka University
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- KAWAMURA Kazuhiko
- Electronics R & D Laboratory, Nippon Steel Coporation
Bibliographic Information
- Other Title
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- Co‐sputter法によるAl及びB添加a‐SiC:H薄膜の電気的特性
- Co-sputterホウ ニ ヨル Al オヨビ B テンカ a SiC H
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Abstract
Groups III impurity (aluminum or boron) has been introduced into a-SiC:H by the cosputtering method. The dependence of the optical, electrical and opto-electronic properties on the imurity content has been investigated.<BR>In the range of the aluminum content z up to about 10-2, the photoconductive nature is maintained and the activation energy of dark conductivity changes, without a significant change in the optical band gap. This suggests the doping effect which is confirmed by the thermoelectric power measurements where the type of conduction changes from n to p with increasing z.<BR>From similar results for boron doped films, the doping efficiency is found to be higher for boron than for aluminium.
Journal
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- Shinku
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Shinku 33 (9), 733-737, 1990
The Vacuum Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001204065328000
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- NII Article ID
- 130000862523
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- NII Book ID
- AN00119871
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- ISSN
- 18809413
- 05598516
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- NDL BIB ID
- 3690976
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed