平板マグネトロンスパッタの動作に及ぼす磁界の影響

DOI

書誌事項

タイトル別名
  • Effects of magnetic field on operation in planar magnetron sputtering.

抄録

Discharge characteristics in planar magnetron sputtering systems have been studied through target erosion patterns. The erosion pattern was affected not only by magnetic flux distribution but also by discharge power and sputtering gas pressure. A model analysis revealed that this behavior was due to interaction between the vertical component of the field and electrons moving in a transverse direction. A definite correlation with the pattern was found, indicating that the transition in the discharge characteristic from magnetron mode to high impedance mode was brought about by the escape of trapped electrons from the target edge.

収録刊行物

  • 金属表面技術

    金属表面技術 37 (6), 308-312, 1986

    一般社団法人 表面技術協会

詳細情報 詳細情報について

  • CRID
    1390001204111254656
  • NII論文ID
    130003994714
  • DOI
    10.4139/sfj1950.37.308
  • ISSN
    18843395
    00260614
  • 本文言語コード
    ja
  • データソース種別
    • JaLC
    • Crossref
    • CiNii Articles
  • 抄録ライセンスフラグ
    使用不可

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