書誌事項
- タイトル別名
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- Growth of Gold Plating Film on Various Nickel Substrates.
- キン メッキ マク ニ タイスル キジ ニッケル ケッショウメン ノ エイキョ
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説明
The effect of the crystal structure of various nickel substrates on the orientation of plated gold films was studied. The gold plating was conducted in a solution primarily composed of gold potassium cyanide at 338K and pH=6.5 with a current density of 5mA/cm2. It was found that the crystal structure of the nickel substrate influenced the orientation of the gold film as follows: (i) for films thinner than 0.2μm, there was epitaxial growth of gold film on the nickel substrate as (111)Au||(111)Ni, (200)Au||(200)Ni and (220)Au||(220)Ni: (ii) for films between 0.2 and 3μm, there was growth of the (110) plane of gold on the nickel substrates; and (iii) for films thicker than 3μm, the growth plane orientations were (111)>(220)>(200), which is considered the characteristics of gold plating under these condition.
収録刊行物
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- 表面技術
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表面技術 43 (9), 868-872, 1992
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390001204114904960
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- NII論文ID
- 130001072681
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DyaK38Xmtlyjtrs%3D
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- ISSN
- 18843409
- 09151869
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- NDL書誌ID
- 3785946
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可