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- 牧野 英司
- 北海道大学 工学研究科
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- 柴田 隆行
- 北海道大学 工学研究科
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- ALLEN David M.
- School of Industrial and Manufacturing Science, Cranfield University
書誌事項
- タイトル別名
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- Electrochemical Photoetching of Rolled Shape Memory Alloy Sheets for Microactuators.
- マイクロアクチュエータ ケイセイ ノ タメ ノ ケイジョウ キオク ゴウキン
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説明
A photoresist-patterned, rolled TiNi (50at% Ti-50at% Ni) sheet 150μm thick was etched electrochemically in 5% H2SO4/CH3OH solution and the effects of applied voltage and pattern width on etch rate and etching accuracy were studied. SEM observation and AES depth analysis revealed that the rolled TiNi specimen had an unetchable surface oxide layer about 3μm thick. The specimen was etched through microcracks in the oxide layer, then distributed throughout the alloy bulk beneath the oxide layer. At an applied voltage exceeding 6V, grooves of different widths were etched uniformly at 0.15μm/s and an etch factor of about 2, independent of groove width. Etched grooves wider than 500μm had a W-shaped profile due to the current flow concentration at the edge of the photoresist mask aperture. At an applied voltage below 5V, uniform etching did not occur at grooves wider than 500μm. We also took a brief look at the oxide removal before etching.
収録刊行物
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- 表面技術
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表面技術 49 (8), 887-893, 1998
一般社団法人 表面技術協会
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キーワード
詳細情報 詳細情報について
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- CRID
- 1390001204115223040
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- NII論文ID
- 10002110307
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DyaK1cXltF2qt7w%3D
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- ISSN
- 18843409
- 09151869
- http://id.crossref.org/issn/09151869
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- NDL書誌ID
- 4546113
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可