書誌事項
- タイトル別名
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- Effect of Pulse Electrolysis on the Hardness and Texture of Nickel Deposit Obtained from Additive Free Watt Bath
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説明
Pulse plating was used to prepare nickel films from a Watts bath with no additives. The influences of the current pulse electrolysis parameters of duty ratio=0.03-0.33, Ton=0.1-5 ms, and Iav=2-10Adm-2, on the hardness, texture, and crystal orientation were investigated. Those characteristics were studied respectively using a nano-indenter hardness tester, scanning electron microscopy, and XRD. Results showed the importance of Iav for obtaining high-hardness films. The highest value of hardness was 4.5 GPa at Ton=1 ms, duty ratio=0.1, and Iav=10 Adm-2. Hardness is related closely to the texture. A Hall-Petch relation was observed between the hardness and grain size. The preferred orientation changed to the(311)→(220)→(200)plane with increase of the duty ratio when the pulse parameters were Ton=1 ms and Iav=5Adm-2.
収録刊行物
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- 表面技術
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表面技術 63 (9), 591-, 2012
一般社団法人 表面技術協会
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詳細情報 詳細情報について
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- CRID
- 1390001204117278720
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- NII論文ID
- 10031075348
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- NII書誌ID
- AN1005202X
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- COI
- 1:CAS:528:DC%2BC3sXos1Sr
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- ISSN
- 18843409
- 09151869
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可