Structure and Photocurrent Density of Electroless Plated Nickel/TiO2 Composite Films

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  • FUKUMURO Naoki
    Graduate School of Engineering, Himeji Institute of Technology
  • USUI Yuki
    Graduate School of Engineering, Himeji Institute of Technology
  • KOMATSU Masaki
    Graduate School of Engineering, Himeji Institute of Technology
  • YAE Shinji
    Graduate School of Engineering, Himeji Institute of Technology JST CREST
  • MATSUDA Hitoshi
    Graduate School of Engineering, Himeji Institute of Technology

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Other Title
  • 無電解Ｎｉ‐Ｐ／ＴｉＯ２複合めっき膜の構造と光電流密度
  • 無電解Ni-P/TiO2複合めっき膜の構造と光電流密度
  • ムデンカイ Ni P TiO2 フクゴウメッキ マク ノ コウゾウ ト コウデンリュウ ミツド

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Abstract

Electroless Plated Ni-P/TiO2 composite films were deposited from an acidic solution or an alkaline solution containing photocatalytic TiO2 particles (P-25). The dispersion of particles in the films was investigated by cross-sectional observation with a transmission electron microscope. The particle content in the films increased with an increase of its amount in the solutions. The deposition rate of composite films was independent of the amount of TiO2 particles in the solutions(0˜100g dm−3). Photocurrent density of the films in 0.1M NaOH aqueous solution rose with particle content in the films.<br>

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