Accuracy of Total Reflection X-Ray Fluorescence Spectrometry near the Detection Limit.

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  • MORI Yoshihiro
    Advanced Technology Research Laboratories, Nippon Steel Corporation
  • KUBOTA Kazuhiko
    Advanced Technology Research Laboratories, Nippon Steel Corporation
  • SHIMANOE Kengo
    Advanced Technology Research Laboratories, Nippon Steel Corporation
  • SAKON Tadashi
    Advanced Technology Research Laboratories, Nippon Steel Corporation

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タイトル別名
  • Accuracy of Total Reflection X-Ray Fluo

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抄録

Total reflection X-ray fluorescence spectrometry (TXRF) is one of the most common tools to analyze metal contaminants on silicon wafers and other substrate surfaces. Although the detection limit of commercial TXRF was improved to the concentration region of 109 atoms cm-2, its accuracy at low concentration was not yet clarified until now. In this paper, we examine the accuracy of the quantitative analysis by TXRF under 1011 atoms cm-2 for Fe, Ni, Cu and Zn. In particular, four factors (standard sample, reference analyzing method, compensation of spurious peak and peak separation) are considered. Under a controlled condition, the accuracy is within 20% as compared with atomic absorption spectropho-tometry (AAS).

収録刊行物

  • Analytical Sciences

    Analytical Sciences 14 (2), 275-280, 1998

    社団法人 日本分析化学会

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