Fatigue Analysis of Micro Resist Pattern Analyzed by the Direct Collapse Method with Atomic Force Microscope

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  • 原子間力顕微鏡を用いた微細レジストドットパターンの疲労解析
  • ゲンシカンリョク ケンビキョウ オ モチイタ ビサイ レジストドットパターン ノ ヒロウ カイセキ

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Abstract

The destruction load of the micro resist pattern is measured quantitatively by means of applying load with an atomic force microscope (AFM) tip. By the fatigue effect, the dot-shaped pattern of 160 nm in diameter, to which the constant load is applied repeatedly with the AFM tip. is destructed. The destruction load without fatigue effect is approximately 90nN, However, withfatigue effect, the pattern destruction occurs even at lower load, 1.3 and 53.1 nN. The results indicate the pronounced fatigue effect by increasing the applying load until 105nN. This methodcan be useful for the quantitative analysis of fatigue effect in micro scale.

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