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- Oizumi Hiroaki
- Association of Super-Advanced Electronics Technologies Kyushu Institute of Technology
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- Tanaka Yuusuke
- Association of Super-Advanced Electronics Technologies
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- Kumise Takaaki
- Association of Super-Advanced Electronics Technologies
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- Shiono Daiju
- Tokyo Ohka Kogyo Co., Ltd., New Technology Development Section
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- Hirayama Taku
- Tokyo Ohka Kogyo Co., Ltd., New Technology Development Section
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- Hada Hideo
- Tokyo Ohka Kogyo Co., Ltd., New Technology Development Section
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- Onodera Junichi
- Tokyo Ohka Kogyo Co., Ltd., New Technology Development Section
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- Yamaguchi Atusko
- Central Research Laboratory, Hitachi. Ltd.
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- Nishiyama Iwao
- Association of Super-Advanced Electronics Technologies
この論文をさがす
抄録
We designed and synthesized a new partially-protected polyphenol, 25X-MBSA-M, for which the position and number of protected hydroxyl groups have no dispersion, and evaluated the EUV patterning performance of a chemically amplified positive-tone resist based on it. EUV imaging experiments were performed using the high-numerical-aperture (NA = 0.3), small-field EUV exposure tool (HINA) at ASET and coherent illumination (σ = 0.0). Patterning results showed the resolution of the resist to be 28 nm, the obtainable aspect ratio to be as high as 2, pattern collapse was markedly suppressed. The line-edge roughness (LER) to be small, with 3σ being 3.9 nm for 35-nm line-and-space patterns at an EUV exposure dose of 12.2 mJ/cm2, and an inspection length, L, of 2000 nm. In addition, we evaluated outgassing of the molecular resist during EUV exposure. The order of outgassing rate of the new molecular resist was almost as same as that of a conventional polymeric PHS-based resist.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 20 (3), 403-410, 2007
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詳細情報 詳細情報について
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- CRID
- 1390001204323769728
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- NII論文ID
- 130004464561
- 40015602505
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD2sXot1Wmsro%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 8918876
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可