Analysis on Deterioration Mechanism of Release Layer in Nanoimprint Process
-
- Tada Yasuhiko
- Materials Research Laboratory, Hitachi Ltd.
-
- Yoshida Hiroshi
- Materials Research Laboratory, Hitachi Ltd.
-
- Miyauchi Akihiro
- Materials Research Laboratory, Hitachi Ltd.
Search this article
Journal
-
- Journal of Photopolymer Science and Technology
-
Journal of Photopolymer Science and Technology 20 (4), 545-548, 2007
The Society of Photopolymer Science and Technology(SPST)
- Tweet
Details 詳細情報について
-
- CRID
- 1390001204323820032
-
- NII Article ID
- 130004464582
- 40015602526
-
- NII Book ID
- AA11576862
-
- COI
- 1:CAS:528:DC%2BD2sXot1WmsLs%3D
-
- ISSN
- 13496336
- 09149244
-
- NDL BIB ID
- 8919306
-
- Text Lang
- en
-
- Data Source
-
- JaLC
- NDL
- Crossref
- CiNii Articles
