Degradation of Hydrocarbon Fluids in the Immersion Lithography at 193nm
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- O'Connor Naphtali A.
- Department of Chemistry, Columbia University
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- Liberman Vladimir
- MIT-Lincoln Laboratories
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- Lei Xuegong
- Department of Chemistry, Columbia University
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- López-Gejo Juan
- Department of Chemistry, Columbia University
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- Turro Nicholas J.
- Department of Chemistry, Columbia University
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- Zimmerman Paul A.
- SEMATECH
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The search for successful generation 3 immersion lithography fluids is focused on high refractive index fluids which are transparent to 193 nm light. This search has led to saturated hydrocarbons which have been shown potential in this field. This paper discusses our observations that many immersion fluid candidates (saturated hydrocarbons and acetonitrile) were observed to polymerize upon irradiation with 193 nm light.
収録刊行物
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- Journal of Photopolymer Science and Technology
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Journal of Photopolymer Science and Technology 21 (5), 607-611, 2008
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詳細情報 詳細情報について
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- CRID
- 1390001204323837312
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- NII論文ID
- 130004464692
- 40016109032
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- NII書誌ID
- AA11576862
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- COI
- 1:CAS:528:DC%2BD1cXosVKqt7c%3D
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- ISSN
- 13496336
- 09149244
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- NDL書誌ID
- 9548431
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可